The photodissociation of phenylsilane at 193 nm-Reference-Cited by-同舟云学术

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The photodissociation of phenylsilane at 193 nm

Published:1986-03 Issue:1 Volume:125 Page:22-26
ISSN:0009-2614
Container-title:Chemical Physics Letters
language:en
Short-container-title:Chemical Physics Letters

Author:

Baggott J.E.,Frey H.M.,Lightfoot P.D.,Walsh R.

Publisher

Elsevier BV

Subject

Physical and Theoretical Chemistry,General Physics and Astronomy

Reference13 articles.

1. C.D. Eley, M.C.A. Rowe and R. Walsh, to be published.

2. Spectrum of SiH2

3. Laser-induced fluorescence of the SiH2 radical

Cited by 35 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Time resolved spectroscopic investigation of SiD2+ D2: kinetic study;EPJ Web of Conferences;2017

2. Direct Time-Resolved Study of the Kinetics of the Reaction of Silylene with Phenylsilane in the Gas Phase. Does SiH2 React with the Aromatic Ring?;Organometallics;2009-10-09

3. Kinetic studies of atmospherically relevant silicon chemistry. Part II: Silicon monoxide reactions;Physical Chemistry Chemical Physics;2009

4. Time-Resolved Cavity Ringdown Measurements and Kinetic Modeling of the Pressure Dependences of the Recombination Reactions of SiH2 with the Alkenes C2H4, C3H6, and t-C4H8;The Journal of Physical Chemistry A;2008-05-31

5. Methylhydrosilyl Chemostructural Effects in Polyhydrosilanes;Macromolecules;2008-01-03

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