Absolute rate constant and temperature dependence for the reaction of silylene with nitrous oxide
Author:
Publisher
Elsevier BV
Subject
Physical and Theoretical Chemistry,General Physics and Astronomy
Reference40 articles.
1. Chapter 3. Reactions of silicon intermediates
2. Silicon chemical vapor deposition one step at a time: fundamental studies of silicon hydride chemistry
3. Reactions of SiH2(X̄1A1) with H2, CH4, C2H4, SiH4 and Si2H6 at 298 K
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