Hydrogenolysis of tetra(allyl)tungsten in the presence of tertiary phosphines: synthesis of tris(dmpm)tungsten (0)-Reference-Cited by-同舟云学术

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Hydrogenolysis of tetra(allyl)tungsten in the presence of tertiary phosphines: synthesis of tris(dmpm)tungsten (0)

Published:1995-08 Issue:2 Volume:498 Page:171-176
ISSN:0022-328X
Container-title:Journal of Organometallic Chemistry
language:en
Short-container-title:Journal of Organometallic Chemistry

Author:

Kirss Rein U.

Publisher

Elsevier BV

Subject

Materials Chemistry,Inorganic Chemistry,Organic Chemistry,Physical and Theoretical Chemistry,Biochemistry

Reference27 articles.

1. Chemical Vapor Deposition for Microelectronics;Sherman,1987

2. Low temperature pyrolysis products of chromium, molybdenum and tungsten hexacarbonyls

3. Properties of chemically vapor-deposited Tungsten thin films on silicon wafers

4. Low‐temperature chemical vapor deposition of tungsten from tungsten hexacarbonyl

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Synthesis and Characterization of Tris(trialkylphosphine)copper(I)trimethylsilylchalcogenolates;Organometallics;2000-10-31

2. Tungsten 1995;Coordination Chemistry Reviews;1997-09

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