In situ resistance measurements of YBaCuO thin films during the oxygenation process for various elaboration conditions-Reference-Cited by-同舟云学术

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In situ resistance measurements of YBaCuO thin films during the oxygenation process for various elaboration conditions

Published:1993-05 Issue: Volume:195 Page:211-214
ISSN:0925-8388
Container-title:Journal of Alloys and Compounds
language:en
Short-container-title:Journal of Alloys and Compounds

Author:

Hosseini Teherani F.,Caristan E.,Depond J.M.,Pech T.,Carrié F.,Kreisler A.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Mechanical Engineering,Mechanics of Materials

Reference12 articles.

1. Proc. ICAM 91;Hosseini Teherani,1992

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Optimization results for YBaCuO film sputtering on polycrystalline zirconia substrates with various growth and oxygenation conditions;Physica C: Superconductivity;1994-12

2. Modelling of the resistive transition of textured YBaCuO thin films sputtered on various application oriented types of substrates;Physica C: Superconductivity;1994-12

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