Photoluminescence of quasi-one dimensional amorphous Si1−xCx:H prepared by the glow discharge method
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Condensed Matter Physics,General Chemistry
Reference12 articles.
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1. Atomic hydrogen-induced chemical vapor deposition of a-Si:C:H thin-film materials from alkylsilane precursors;Diamond and Related Materials;1997-07
2. Photoluminescence in Hydrogenated Amorphous Carbon;Physics and Applications of Non-Crystalline Semiconductors in Optoelectronics;1997
3. Relationship between hydrogenation and optical properties of dielectrica‐SiC:H films prepared by tetrakis(trimethylsilyl)silane in remote H2plasma;Journal of Applied Physics;1995-03
4. Evaluation Of Reaction Dynamics Of Film Depositions In Plasma Cvds By Using A Remote Plasma Cvd System;MRS Proceedings;1995
5. Preparation and Deposition Mechanism of a ‐ SiC : H Films by Using Hexamethyldisilane in a Remote H 2 Plasma;Journal of The Electrochemical Society;1994-10-01
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