Adsorption of atomic and molecular oxygen on Si(0 0 1)2 × 1: Coverage dependence of the Auger O K V V lineshape
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Condensed Matter Physics,General Chemistry
Reference27 articles.
1. Chemical titration of clean silicon surfaces with N2O and O2: Atomic nature of ‘‘5×1’’ reconstructed Si(110)
2. Atomic nature of ‘5 × 1’ reconstructed Si(110) as revealed by chemical titration with N2O and O2: AES and LEED results
3. Adsorption of atomic oxygen (N2O) on a clean Si(100) surface and its influence on the surface state density; A comparison with O2
4. Decomposition of N2O on the Si(100)2 × 1 and Si(111)7 × 7 surfaces: Determination of the density of broken bonds
5. An investigation of the interaction of N2O with the Si(111)−7 × 7 surface using AES and optical reflectometry; A comparison with O2
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1. Auger-photoelectron coincidence spectroscopy of SiO2;Journal of Electron Spectroscopy and Related Phenomena;2007-10
2. Influence of Si/Al ratio on Auger line intensities of zeolites;Zeolites;1996-09
3. The Role of Inter-Atomic Transitions in AES;Physica Scripta;1992-01-01
4. Interaction of atomic oxygen (N2O) with a clean Si(001) surface: O adsorption geometries as derived from the O KVV Auger lineshape;Surface Science;1992-01
5. The influence of inter-atomic transitions in Auger valence band spectroscopy: oxygen on Si(001)2 × 1;Surface Science;1991-11
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