A study of Al/Si(111)-cleaved interface by photoemission, Auger electron yield, and Auger electron spectroscopies
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Condensed Matter Physics,General Chemistry
Reference22 articles.
1. Surface States and Rectification at a Metal Semi-Conductor Contact
2. Surface spectroscopy of Schottky-barrier formation on Si(111) 7 × 7: Photoemission studies of filled surface states and band bending
3. Chemical reactions and local charge redistribution at metal-CdS and CdSe interfaces
4. Physics of Semiconductors 1978;Bauer,1979
Cited by 17 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Augerelektronenspektroskopie (AES) zur Untersuchung von Festkörperoberflächen - Stand und neuere Entwicklungen auf den Gebieten der quantitativen Analyse und der chemischen Information;Zeitschrift für Chemie;2010-08-31
2. Structure of Al/Si(111) interfaces: A photoemission extended x-ray-absorption fine-structure study;Physical Review B;1991-09-15
3. Epitaxial growth of Al on Si by thermal evaporation in ultra-high vacuum: growth on Si(100)2 × 1 single and double domain surfaces at room temperature;Surface Science;1990-10
4. The adsorption and thermal decomposition of trimethylamine alane on aluminum and silicon single crystal surfaces: kinetic and mechanistic studies;Surface Science;1990-10
5. Epitaxial growth of Al on Si (100) and Si (111) by evaporation in uhv;Vacuum;1990-01
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3