Dicing of Thin Si Wafers with a Picosecond Laser Ablation Process
Author:
Publisher
Elsevier BV
Subject
General Engineering
Reference3 articles.
1. Bovatsek J M, Patel R S. Highest-speed dicing of thin silicon wafers with nanosecond-pulse 355nm q-switched laser source using line-focus fluence optimization technique. Proc. SPIE 7585. Santa Clara, CA. 2010.
2. Masayoshi K, Naoki U, Etusji O, Ryuji S, Kazuhiro A, and Kenshi F. Advanced Dicing Technology for Semiconductor Wafer -Stealth Dicing. Semiconductor Manufacturing, VOL. 20, NO. 3, Taiwan. 2007.
3. Richerzhagen B, Industrial applications of the water-jet guided laser. The Industrial Laser User, Issue 28, Switzerland. 2003 [4] Liu J M. Simple technique for measurements of pulsed Gaussian-beam spot sizes. Optics Letters, Vol. 7, Nr. 5, 1982.
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