Use of a CSLM for the analysis of chemical etched tracks in PADC
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Radiation
Reference2 articles.
1. Aberrations in confocal fluorescence microscopy induced by mismatches in refractive index;Hell;Journal of Microscopy,1993
2. Confocal microscopy in the analysis of the etched nuclear particle tracks in polymers;Jakes;Journal of Microscopy,1995
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