Nail salon dust reveals alarmingly high photoinitiator levels: Assessing occupational risks-Reference-Cited by-同舟云学术

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Nail salon dust reveals alarmingly high photoinitiator levels: Assessing occupational risks

Published:2024-08 Issue: Volume:475 Page:134913
ISSN:0304-3894
Container-title:Journal of Hazardous Materials
language:en
Short-container-title:Journal of Hazardous Materials

Author:

Shen Jie,Liu Jiale,Ji Xiaomeng,Liang Jiefeng,Feng Xiaoxia,Liu Xiaoyun,Wang Yingjun,Zhang Qingzhe,Zhang Qiu,Qu Guangbo,Yan Bing,Liu Runzeng

Funder

National Natural Science Foundation of China

Natural Science Foundation of Shandong Province

Publisher

Elsevier BV

Reference73 articles.

1. Photoinitiated polymerization: advances, challenges, and opportunities;Yagci;Macromolecules,2010

2. Photoinitiated polymerization of biomaterials;Fisher;Annu Rev Mater Res,2001

3. Toxicological impacts of benzophenone on the liver of guinea pig (Cavia porcellus);Dutta;Bull Environ Contam Toxicol,1993

4. 4-Methylbenzophenone and benzophenone are inactive in the micronucleus assay;Abramsson-Zetterberg;Toxicol Lett,2011

5. Carcinogenesis studies of benzophenone in rats and mice;Rhodes;Food Chem Toxicol,2007

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Elevated Levels of Photoinitiators in Nail Salon Workers’ Hand Wipes and Occupational Risk Estimation;Environmental Science & Technology Letters;2024-09-04

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