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Measurements of contact potential difference (work functions) of metals and semiconductors surface by the static ionized capacitor method

  • Published:2003-09 Issue:1-3 Volume:105 Page:329-339
  • ISSN:0001-8686
  • Container-title:Advances in Colloid and Interface Science
  • language:en
  • Short-container-title:Advances in Colloid and Interface Science

Author:

Novikov Sergey Nikolaevich,Timoshenkov Sergey Petrovich

Publisher

Elsevier BV

Subject

Colloid and Surface Chemistry,Physical and Theoretical Chemistry,Surfaces and Interfaces

Reference10 articles.

1. Modern Methods of Surface Investigations;Woodruff,1989

2. Measurements of the contact potential difference by the ionization method;Dymovich,1976

3. The instrument for the contact potential difference measurement ‘Aphatest’;Dymovich;Electron. Ind.,1982

4. Electronic Processes on Semiconductor Surface at Chemosorption, Moscow;Volkenshtein,1987

5. Contact-difference studies of adsorption of polar vapors on metal and polymer surfaces;Fort;Coll. J. Interface Sci.,1969
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