1. Interconnect scaling-The real limiter to high performance ULSI;Bohr,1995
2. Functional high-speed characterization and modeling of a six-layer copper wiring structure and performance comparison with aluminum on-chip interconnections;Deutsch,1998
3. Interconnect design strategy: Structures, repeaters and materials toward 0.1μm ULSI's with a giga-hertz clock operation, Tech;Takahashi;Dig. IEEE Int. Electron Devices Meeting,1998
4. Scaling effect on electromigration in on-chip Cu wiring;Hu,1999
5. Fabrication and performance limits of sub-0.1 micrometer Cu interconnects;Kuan;Proc. of Mat. Res. Soc. Symp.,2000