The Research on Process Technology of SiGe/Si HBT

Author:

Sumei Jia,Ruixia Yang

Publisher

Elsevier BV

Subject

Applied Mathematics

Reference6 articles.

1. Silicon germanium base heterojunction bipolar transistors by molecular beam epitaxy [C];IYER;Int Elec Dev Meet,1987

2. Jia Sumei, Yang Ruixia, Liu Yingkun, Deng Jianguo, Xin Qiming. SiGe HBT emitter mesa etching technique since the suspension of [J]. Semiconductor technology, has been hired.

3. Polysilicon emitter transistors and integrated circuits [M];Wang Yangyuan,1992

4. EMMANUEL F, WAI LEE, JOHN D. CRESSLER, et al. 73-GHz Self-Aligned SiGe-Base Bipolar Transistors with Phosphorus-Doped polysilicon Emitters [J]. IEEE Electron devices, 1992, 13 (5): 259-261.

5. Jia Lin, Ni Xuewen, Guan Dongxu, Zhang Lu, Ning Baojun. FT plane to 13.5GHz SiGe heterojunction bipolar transistor structure of the research [J]. Peking University, 2001,37 (3): 354-357.

Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Modelling of the active defects influence on the electrical characteristics of an SiGe-HBT;Chinese Journal of Physics;2017-08

2. Regrowth characteristics of SiGe/Si by IBIEC and SPEG;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2013-07

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