Determination of Plasma Electron Temperature in a Pulsed Inductively Coupled Plasma (PICP) device-Reference-Cited by-同舟云学术

Determination of Plasma Electron Temperature in a Pulsed Inductively Coupled Plasma (PICP) device

Published:2012 Issue: Volume:32 Page:929-935
ISSN:1877-7058
Container-title:Procedia Engineering
language:en
Short-container-title:Procedia Engineering

Author:

Chaisombat S.,Ngamrungroj D.,Tangjitsomboon P.,Mongkolnavin R.

Publisher

Elsevier BV

Subject

Applied Mathematics

Reference6 articles.

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3. Inductively Coupled Pulsed Plasmas in the Presence of Synchronous Pulsed Substrate Bias for Robust;Banna;Reliable, and Fine Conductor Etching. IEEE T PLASMA SCI.,2009

4. Prasertsung I, et al. The Effects of Pulse Inductively Coupled Plasma on the Properties of Gelatin. 13th International Conference on Biomedical Engineering IFMBE Proceedings; 2009, p. 1217-1219.

5. Laser and Proc. Second Tropical College on Applied Physics;Lee,1986

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