Etching resistance and etching behavior of h-BN textured ceramics under Xe plasma condition-Reference-Cited by-同舟云学术

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Etching resistance and etching behavior of h-BN textured ceramics under Xe plasma condition

Published:2021-12 Issue: Volume: Page:
ISSN:0272-8842
Container-title:Ceramics International
language:en
Short-container-title:Ceramics International

Author:

Tian Zhuo^ORCID,Qiu Baofu,Qu Jiao,Chen Heng,Wang Juan

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Process Chemistry and Technology,Ceramics and Composites,Electronic, Optical and Magnetic Materials

Reference28 articles.

1. Spacecraft electric propulsion-an overvicew;Martinez-Sanchez;J. Propul. Power,1998

2. Wall material effects in stationary plasma thrusters. Ⅰ. Parametric studies of an SPT-100;Gascon;Phys. Plasmas,2003

3. Wall material effects in stationary plasma thrusters. Ⅱ. Near-wall and in-wall conductivity;Barrl;Phys. Plasmas,2003

4. Secondary electron emission from dielectric materials of a Hall thruster with segmented electrodes;Dunaevsky;Phys. Plasmas,2003

5. Discharge plasma instabilities in the presence of an external constant electric field;Shokri;Phys. Plasmas,2003

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Research and application of biomimetic modified ceramics and ceramic composites: A review;Journal of the American Ceramic Society;2023-10-14

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