Microstructure of silicon-incorporated carbon films with various silicon concentrations deposited by hybrid magnetron sputtering/chemical vapor deposition-Reference-Cited by-同舟云学术

Microstructure of silicon-incorporated carbon films with various silicon concentrations deposited by hybrid magnetron sputtering/chemical vapor deposition

Published:2013-07 Issue:5 Volume:39 Page:5585-5590
ISSN:0272-8842
Container-title:Ceramics International
language:en
Short-container-title:Ceramics International

Author:

Cheng Hsin-Chung,Wang Duen-Jeng,Lan Wen-Chien,Wang Pei-Yi,Ou Shih-Fu,Hsu Ya-Ju,Ou Keng-Liang

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Process Chemistry and Technology,Ceramics and Composites,Electronic, Optical and Magnetic Materials

Reference34 articles.

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4. Corrigendum to “Microstructure of silicon-incorporated carbon films with various silicon concentrations deposited by hybrid magnetron sputtering/chemical vapor deposition” [Ceram. Int. 39 (2013) 5585–5590];Ceramics International;2014-07