Correlation between resistive switching characteristics and density of traps observed in Zr3N2 resistive switching memory devices with TiN barrier electrode

Author:

Doowon Lee,Dongjoo Bae,Sungho Kim,Kim Hee-DongORCID

Funder

National Research Foundation of Korea

Ministry of Education

Ministry of Trade, Industry and Energy

Korea Institute for Advancement of Technology

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Process Chemistry and Technology,Ceramics and Composites,Electronic, Optical and Magnetic Materials

Reference68 articles.

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3. An overview of phase-change memory device physics;Le Gallo;J. Phys. D Appl. Phys.,2020

4. Novel cell structure of PRAM with thin metal layer inserted GeSbTe;Yi,2003

5. Basic principles of STT-MRAM cell operation in memory arrays;Khvalkovskiy;J. Phys. D Appl. Phys.,2013

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