Eco-friendly, low-temperature solution production of oxide thin films for high-performance transistors via infrared irradiation of chloride precursors-Reference-Cited by-同舟云学术

Eco-friendly, low-temperature solution production of oxide thin films for high-performance transistors via infrared irradiation of chloride precursors

Published:2019-06 Issue:8 Volume:45 Page:9829-9834
ISSN:0272-8842
Container-title:Ceramics International
language:en
Short-container-title:Ceramics International

Author:

Wang Sumei,Yao Shushan,Lin Jiangshan,Xia Guodong

Funder

National Natural Science Foundation of China

Shandong Province Excellent Talent

National-level College Students Innovative Entrepreneurial Training Plan

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Process Chemistry and Technology,Ceramics and Composites,Electronic, Optical and Magnetic Materials

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