Experimental investigation on magnetorheological shear thickening polishing characteristics for SiC substrate

Author:

Ma Xifeng,Tian YebingORCID,Qian Cheng,Ma Zhen,Ahmad Shadab,Li Ling,Fan Zenghua

Funder

Taishan Scholar Foundation of Shandong Province

National Natural Science Foundation of China

Publisher

Elsevier BV

Reference41 articles.

1. Silicon carbide in contention;Madar;Nature,2021

2. Silica films on silicon carbide: a review of electrical properties and device applications;Raynaud;J. Non-Cryst. Solids,2001

3. Equivalent thin-plate method for stressed mirror polishing of an off-axis aspheric silicon carbide lightweight mirror;Yi;Opt Express,2020

4. Silicon carbide high-power devices;Weitzel;IEEE Trans. Electron. Dev.,1996

5. Review of silicon carbide power devices and their applications;She;IEEE Trans. Ind. Inf.,2017

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