Diffusion profile of spin-on dopant in silicon substrate-Reference-Cited by-同舟云学术

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Diffusion profile of spin-on dopant in silicon substrate

Published:1989-11 Issue:3-5 Volume:19 Page:237-247
ISSN:0165-1633
Container-title:Solar Energy Materials
language:en
Short-container-title:Solar Energy Materials

Author:

Teh S.T.,Chuah D.G.S.

Publisher

Elsevier BV

Subject

General Engineering

Reference8 articles.

1. Solar Cells;Hovel,1975

2. Silicon Semiconductor Technology;Runyan,1965

3. A Study of Diffusion Process in Silicon Substrate using Spin-on Dopant;Teh,1988

4. Phosphorus Diffusion in Silicon from a Spin‐on P‐Doped Silicon Oxide Film

5. Resistivity of Bulk Silicon and of Diffused Layers in Silicon

Cited by 14 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Phosphorus doping of ZnO using spin‐on dopant process: A better choice than costly and destructive ion-implantation technique;Journal of Luminescence;2021-05

2. Boron Spin-On Doping for Poly-Si/SiOx Passivating Contacts;ACS Applied Energy Materials;2021-04-28

3. Engineering of the spin on dopant process on silicon on insulator substrate;Nanotechnology;2020-10-20

4. Teaching undergraduate students integrated photonics and fabrication through research;Fifteenth Conference on Education and Training in Optics and Photonics: ETOP 2019;2019-07-02

5. Effect of low temperature oxidation (LTO) in reducing boron skin in boron spin on dopant diffused emitter;AIP Conference Proceedings;2016

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