A comparative study of diffusion induced grain boundary migration, recrystallization and volume diffusion during the low temperature diffusion of Al into Cu and Au

Author:

Den Broeder F.J.A.,Klerk M.,Vandenberg J.M.,Hamm R.A.

Publisher

Elsevier BV

Subject

General Engineering

Cited by 42 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Influence of Isothermal Annealing on Mechanical Properties of Cu-Clad Al Wire;MATERIALS TRANSACTIONS;2020-06-01

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3. Rate-Controlling Process of Compound Growth in Cu-Clad Al Wire during Isothermal Annealing at 483–543 K;MATERIALS TRANSACTIONS;2020-01-01

4. Investigation of Cu–Al surface alloy formation on Cu substrate;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2010-03

5. Dynamic Recrystallization (DRX) as the Mechanism for Sn Whisker Development. Part I: A Model;Journal of Electronic Materials;2009-07-07

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