Improved target system for production of high purity [18F]fluorine via the 18O(p,n)18F reaction-Reference-Cited by-同舟云学术

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Improved target system for production of high purity [18F]fluorine via the 18O(p,n)18F reaction

Published:2000-06 Issue:6 Volume:52 Page:1431-1440
ISSN:0969-8043
Container-title:Applied Radiation and Isotopes
language:en
Short-container-title:Applied Radiation and Isotopes

Author:

Hess E.,Blessing G.,Coenen H.H.,Qaim S.M.

Publisher

Elsevier BV

Subject

Radiation

Reference16 articles.

1. Surface-sensitive analysis of materials used in [18F]electrophilic fluorine production;Alvord,1995

2. Surface-sensitive analysis of materials used in [18F]electrophilic fluorine production. II. Effects of postpassivation exposure;Alvord,1997

3. The effect of target-gas purity on the chemical form of 18F during [18F]F2 production using the neon/fluorine target;Bida;J. Nucl. Med.,1980

4. TRIM: The Stopping and Range of Ions and Solids;Biersack,1985

5. Identification and quantitation of fluorine generated in [18F]F2 target systems;Bishop;Nucl. Med. Biol.,1996

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