Effects of sputtering pressure on nanostructure and nanomechanical properties of AlN films prepared by RF reactive sputtering-Reference-Cited by-同舟云学术

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Effects of sputtering pressure on nanostructure and nanomechanical properties of AlN films prepared by RF reactive sputtering

Published:2014-09 Issue:9 Volume:24 Page:2845-2855
ISSN:1003-6326
Container-title:Transactions of Nonferrous Metals Society of China
language:en
Short-container-title:Transactions of Nonferrous Metals Society of China

Author:

WEI Qiu-ping,ZHANG Xiong-wei,LIU Dan-ying,LI Jie,ZHOU Ke-chao,ZHANG Dou,YU Zhi-ming

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Geotechnical Engineering and Engineering Geology,Condensed Matter Physics

Reference42 articles.

1. The intrinsic thermal conductivity of AIN [J];SLACK;Journal of Physics and Chemistry of Solids,1987

2. Preparation and piezoelectric properties of (100) oriented AlN film [J];YIN;Journal of Optoelectronics Laser,2012

3. The electrical, optical and magnetic properties of Si-doped ZnO films [J];LUO;Applied Surface Science,2012

4. Filtering performance improvement in V-doped ZnO/diamond surface acoustic wave filters [J];LUO;Applied Surface Science,2010

5. A new type of glucose biosensor based on surface acoustic wave resonator using Mn-doped ZnO multilayer structure [J];LUO;Biosensors & Bioelectronics,2013

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2. Correlation between Crystallite Characteristics and the Properties of Copper Thin Film Deposited by Magnetron Sputtering: Bias Voltage Effect;Journal of Nano Research;2024-07-23

3. AlN Sputtering Parameter Estimation Using A Multichannel Parallel DCT Neural Network;2024 IEEE 42nd VLSI Test Symposium (VTS);2024-04-22

4. A strong dependence of sputtering power on c‐axis oriented aluminium nitride on Si (111): A structural and electrical study;IET Nanodielectrics;2024-01-03

5. The evolution of preferred orientation and morphology of AlN films under various sputtering parameters;Journal of Crystal Growth;2024-01

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