Surface Finishing of a Cemented Tungsten Carbide Chip due to Ion Beam Sputter-Etching-Reference-Cited by-同舟云学术

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Surface Finishing of a Cemented Tungsten Carbide Chip due to Ion Beam Sputter-Etching

Published:1981 Issue:1 Volume:30 Page:499-503
ISSN:0007-8506
Container-title:CIRP Annals
language:en
Short-container-title:CIRP Annals

Author:

Taniguchi Norio,Miyamoto Iwao

Publisher

Elsevier BV

Subject

Industrial and Manufacturing Engineering,Mechanical Engineering

Reference5 articles.

1. MICROSTRUCTURE ARRAYS PRODUCED BY ION MILLING

2. Ion Implantation, Sputtering and Their Application;Townsend,1976

3. Ion Sputter-machining of Iron and Steel;Taniguchi;Annals of the CIRP,1975

4. Ion Beam Sputter-machining of Glass in Aspheric Lens Making;Taniguchi;Annals of the CIRP,1974

5. Ion Sputter-machining of Diamond;Miyamoto;Bull. Japan Soc. of Prec. Engg.,1979

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Treatment of boar sperm with nanoparticles for improved fertility;Theriogenology;2019-10

2. Ion beam transfer of fine mechanical patterns into cemented carbide chips;Surface and Coatings Technology;1994-08

3. Principle of Ion Beam Processing and its Application to Fine and Precision Fabrication;International Progress in Precision Engineering;1993

4. Ion Beam Fabrication of Ultrafine Patterns on Cemented Carbide Chips with Ultrafine Grains;CIRP Annals;1993

5. Ion-Beam Machining of Tungsten Carbide Chips — Fabrication of Fine Patterns;CIRP Annals;1991

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