1. Technological Advances in Fine Abrasive Processes;Komanduri;Annals of the CIRP,1997
2. Material Removal Mechanisms in Lapping and Polishing;Evans;Annals of the CIRP,2003
3. PVA-WP stone;Yamada;Journal of JSAT,1999
4. Fujishima, A., Hashimoto, H., Watanabe, T., 1997, The Photo-Clean Revolution, CMC.
5. Grinding of Si3N4 Ceramic Balls with the Aid of Photo-Catalyst of TiO2;Zhang;Annals of the CIRP,2002