Determination of the layered structure in Mo/Si multilayers by grazing incidence X-ray reflectometry
Author:
Publisher
Elsevier BV
Subject
Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Reference15 articles.
1. Soft x-ray projection lithography using an x-ray reduction camera
2. Multilayer coating of 10X projection optics for extreme ultraviolet lithography
3. Characterization of molybdenum/silicon multilayers deposited by ion beam sputtering and rf magnetron sputtering
4. E. Louis, A.E. Yakshin, P.C. Gorts, S. Abdali, E.L.G. Maas, R. Stuik, F. Bijkerk, Reflectivity of Mo/Si multilayer systems for EUVL, SPIE Conference 3676, Santa Clara, March 1999.
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