Control of nano-structure of the initial growth layers of Co–Cr thin films deposited by facing targets sputtering
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference7 articles.
1. Extremely high bit density recording with single-pole perpendicular head
2. Relationships between high density recording performance and particle coercivity distribution
3. The magnetic anisotropy in the initial layer of Co-Cr sputtered thin films
4. Comparison of surface and volume coercive field of sputtered CoCr thin films
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1. Enhanced Permeability Property of Silicon Oxide Thin Films Deposited by Facing Target Sputtering System for OLED Application;Molecular Crystals and Liquid Crystals;2016-02-11
2. Preparation of SiOxNy Films by Facing-Target Sputtering System for Thin-Film Passivation Layers of OLEDs;Journal of the Korean Physical Society;2008-09-12
3. Deposition of an Al Cathode for an OLED by Using Low-Damage Sputtering Method;Journal of the Korean Physical Society;2007-09-15
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