Studies of process parameter controlled composition variation in sputtered YBa2Cu3O7 − x films
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference42 articles.
1. Effect of sputtering current on the growth of Y‐Ba‐Cu‐O films
2. On‐axis sputter deposition of superconducting YBa2Cu3O7‐δ on Si(100)
3. Synthesis and properties of YBa2Cu3O7 thin films grown in situ by 90° off-axis single magnetron sputtering
4. Preferentially oriented epitaxial Y‐Ba‐Cu‐O films prepared by the ion beam sputtering method
5. Synthesis and characterization of Bi2Sr2Can−1CunOy(n=1–7) thin films grown by off‐axis, three target magnetron sputtering
Cited by 4 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Effect of deposition parameters on composition, structures, density and topography of CrN films deposited by r.f. magnetron sputtering;Applied Surface Science;2002-11
2. Process-kinetics in facing targets sputtering of multi-component oxide thin films;Thin Solid Films;1999-06
3. Transport of sputtered atoms in facing targets sputtering geometry: A numerical simulation study;Journal of Applied Physics;1998-07
4. Study of the processes occurring when sputtering YBa2Cu3O7 − x in pure oxygen;Vacuum;1998-03
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