Discharge cleaning with hydrogen plasma-Reference-Cited by-同舟云学术

Discharge cleaning with hydrogen plasma

Published:2001-05 Issue:2-4 Volume:61 Page:367-371
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Mozetič Miran

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference18 articles.

1. Investigation of adsorption and absorption processes of hydrogen in plasma devices with ss or ti-coated walls

2. Electron cyclotron resonance discharge cleaning of JFT-2 Tokamak (Jaeri)

3. Rate of Production of Water Vapour in Low-Power, High-Repetition-Rate Discharge Cleaning

4. Low temperature epitaxial silicon film growth using high vacuum electron‐cyclotron‐resonance plasma deposition

5. Montgomery JS, Barnak JP, Silvestre C, Hauser JR, Nemanich JR. In: Liehr M, Heyns M, Hirose M, editors. Ultraclean semiconductor processing technology and surface chemical cleaning and pasivation. Pittsburg: Mater Sci Soc, 1995. p. 279.

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