Influences of working pressure on properties for TiO2 films deposited by DC pulse magnetron sputtering-Reference-Cited by-同舟云学术

Influences of working pressure on properties for TiO2 films deposited by DC pulse magnetron sputtering

Published:2009-01 Issue:6 Volume:21 Page:741-744
ISSN:1001-0742
Container-title:Journal of Environmental Sciences
language:en
Short-container-title:Journal of Environmental Sciences

Author:

ZHANG Can,DING Wanyu,WANG Hualin,CHAI Weiping,JU Dongying

Publisher

Elsevier BV

Subject

General Environmental Science,General Medicine,Environmental Chemistry,Environmental Engineering

Reference11 articles.

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2. Ding W Y. 2007. The properties of ultra-thin a-SiNx films prepared by microwave ECR magnetic sputtering. Ph.D Dissertation. Dalian University of Technology, China.

3. Preparation of highly ordered titanium dioxide porous films: Characterization and photocatalytic activity;Doon;Separation & Purification Technology,2007

4. Photocatalytically active thin films on float glass with enhanced hydrophilicity and transmission for photovoltaic applications;Heft;Solar Energy Materials & Solar Cells,2006

5. Effects of internal stress on photocatalytic properties of TiO2 films;Miyamura;Thin Solid Films,2008

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