Ion Beam Etching

Author:

PUCKETT P. REESE,MICHEL STEPHEN L.,HUGHES WILLIAM E.

Publisher

Elsevier

Reference38 articles.

1. Operation of Broad-Beam Sources;Kaufman,1987

2. Technology and applications of broad‐beam ion sources used in sputtering. Part I. Ion source technology

3. Handbook of Ion Beam Processing Technology;Kaufman,1989

4. Thirty-eight-centimeter ion source

5. G. K. Wehner et al., General Mills Report 2309. General Mills Electronic Division, Minneapolis, Minnesota, 1962.

Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Failure Detection and Remaining Life Estimation for Ion Mill Etching Process Through Deep-Learning Based Multimodal Data Fusion;Journal of Manufacturing Science and Engineering;2019-08-31

2. Plasma Processing of III-V Materials;Handbook of Advanced Plasma Processing Techniques;2000

3. Diffractive components: computer-generated elements;Perspectives for Parallel Optical Interconnects;1993

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