Glow Discharge Plasmas and Sources for Etching and Deposition-Reference-Cited by-同舟云学术

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Glow Discharge Plasmas and Sources for Etching and Deposition

Published:1991 Issue: Volume: Page:11-77
ISSN:
Container-title:Thin Film Processes
language:
Short-container-title:

Author:

ROSSNAGEL STEPHEN M.

Publisher

Elsevier

Reference39 articles.

1. “Plasma Etching”;Cohen,1989

2. “Glow Discharge Processes,”;Chapman,1980

3. “Handbook of Plasma Processing Technology”;Cecchi,1990

4. “Thin Film Processes,”;Vossen,1978

5. Mechanisms for Power Deposition in Ar/SiH4 Capacitively Coupled RF Discharges

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Oxygen Generation by Carbon Dioxide Glow Discharge and Separation by Permeation Through Ultrathin Silver Membranes;Earth and Space Science;2019-04

2. Nanoscale fabrication by intrinsic suppression of proximity-electron exposures and general considerations for easy and effective top–down fabrication;Journal of Micromechanics and Microengineering;2010-11-12

3. Plasma Deposition;Wiley Encyclopedia of Electrical and Electronics Engineering;1999-12-27

4. Processing Plasmas and Reactors;Chemical Vapor Deposition;1995

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