Black phosphorus supported Ni2P co-catalyst on graphitic carbon nitride enabling simultaneous boosting charge separation and surface reaction
Author:
Funder
National Research Foundation of Korea
Publisher
Elsevier BV
Subject
Process Chemistry and Technology,General Environmental Science,Catalysis
Reference63 articles.
1. Particulate photocatalysts for overall water splitting
2. Semiconductor-based Photocatalytic Hydrogen Generation
3. Plasmon-Sensitized Graphene/TiO2 Inverse Opal Nanostructures with Enhanced Charge Collection Efficiency for Water Splitting
4. Artificial Photosynthesis: Solar Splitting of Water to Hydrogen and Oxygen
5. Heterogeneous photocatalyst materials for water splitting
Cited by 137 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Constructing high efficient carrier channels in double ternary compounds MoSSe/CdSSe heterojunction for photoelectrochemistry and electrocatalytic hydrogen production;Journal of Alloys and Compounds;2024-12
2. Fabrication of black phosphorus/CdS heterostructure with enhancement photocatalytic degradation activity for tetrabromobisphenol A and toxicity prediction of intermediates;Environmental Research;2024-09
3. A bibliographic analysis of optimization of hydrogen production via electrochemical method using machine learning;Fuel;2024-09
4. Adjustable double cation vacancies MnSex/FeSex p-n heterojunction catalysts on improving multifunctional photocatalytic and photoelectrochemical performance;Separation and Purification Technology;2024-09
5. Boosting photoelectrocatalytic hydrogen evolution of Bi@OV-BiOBr/Cu3P high-low heterojunction with dual-channel charge transfer;Applied Catalysis B: Environment and Energy;2024-08
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3