1. H.C. Theurer, J. Electrochem. Soc. 108 (1961) 649. 1.
2. D.J. Meyer, Proceedings of the International Symposium on ULSI Process Integration IV, The Electrochemical Society, ISBN 1-56677-464-0, 2005, pp. 81–96.
3. D.J. Meyer, M. Hawkins, The deposition of in-situ doped polysilicon in a single wafer reactor, in: 180th Meeting of the Electrochemical Society, Phoenix, Arizona, 1991.
4. D.J. Meyer, J. Italiano, Productive single wafer Si1−xGex processing, in: 196th Meeting of the Electrochemical Society, Honolulu, Hawaii, 1999.