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The Low Pressure Plasma Processing Environment

Published:2010 Issue: Volume: Page:157-193
ISSN:
Container-title:Handbook of Physical Vapor Deposition (PVD) Processing
language:
Short-container-title:

Author:

Mattox Donald M.

Publisher

Elsevier

Reference30 articles.

1. The historical development of controlled ion-assisted and plasma-assisted PVD processes;Mattox,1997

2. Gas pumping in discharge tubes;Chester;Phys. Rev.,1968

3. A sputtering wind;Hoffman;J. Vac. Sci. Technol.,1985

4. Formation of thin films by remote plasma enhanced chemical vapor deposition (remote PECVD);Lucovsky,1990

5. Diagnostic methods for sputtering plasmas;Thornton;J. Vac. Sci. Technol.,1978

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Effect of low‐pressure cold plasma on the properties of edible film based on alginate enriched with Dunaliella salina powder;Plasma Processes and Polymers;2022-01-27

2. Grid-Assisted Co-Sputtering Method: Background, Advancement, and Prospect;Plasma Chemistry and Plasma Processing;2021-03-20

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