(Photo)electrochemistry: a suitable tool for investigating wet etching processes on III–V semicondutors

Author:

Goossens H.H.,Gomes W.P.

Publisher

Elsevier BV

Subject

Electrochemistry,General Chemical Engineering

Cited by 15 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Photoanodic oxidation of InP in acid solution and its surface chemistry: On the interplay of photons, protons and hydrodynamics;Electrochimica Acta;2020-11

2. Metal electrode influence on the wet selective etching of GaAs/AlGaAs;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2011-07

3. Influence of defects on the formation of thin porous GaP(001) films;Crystallography Reports;2003-09

4. Fundamentals of Semiconductor Electrochemistry and Photoelectrochemistry;Encyclopedia of Electrochemistry;2002-01-29

5. Wet etching of III–V semiconductors;Handbook of Advanced Electronic and Photonic Materials and Devices;2001

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