Infrared spectroscopic techniques for quantitative characterization of dielectric thin films on silicon wafers-Reference-Cited by-同舟云学术

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Infrared spectroscopic techniques for quantitative characterization of dielectric thin films on silicon wafers

Published:1994-09 Issue:10 Volume:50 Page:1687-1723
ISSN:0584-8539
Container-title:Spectrochimica Acta Part A: Molecular Spectroscopy
language:en
Short-container-title:Spectrochimica Acta Part A: Molecular Spectroscopy

Author:

Franke James E,Niemczyk Thomas M,Haaland David M

Publisher

Elsevier BV

Subject

General Engineering

Reference176 articles.

Cited by 21 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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2. Borosilicate glass nanolayer as a spin-on dopant source: FTIR and spectroscopic ellipsometry investigations;Journal of Materials Science: Materials in Electronics;2016-03-04

3. Infrared Characterization of Device-Quality Silicon;Handbook of Vibrational Spectroscopy;2006-08-15

4. Optimization strategies for parametric analysis of thin-film reflectivity spectra;IEEE Transactions on Instrumentation and Measurement;2003-10

5. Study of structure and quality of different silicon oxides using FTIR and Raman microscopy;SPIE Proceedings;2003-03-17

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