Author:
Weiser M.,Oberschachtsiek P.,Günzler R.,Schüle V.,Kalbitzer S.
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Cited by
9 articles.
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1. Profile of implanted in potassium titanyl phosphate by the , C nuclear reaction;Journal of Physics D: Applied Physics;1998-09-07
2. 20 keV—40 MeV lithium implantation profiles in aluminium;Surface and Coatings Technology;1992-04
3. Damage profiles in MgO after ion implantation;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1992-03
4. 3D concentration distributions of ion implants in amorphous solids;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1992-01
5. Range parameters of deep ion implants in group IV semiconductors;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1992-01