Structure and dielectric characterization of a chemically vapor deposited diamond thick film-Reference-Cited by-同舟云学术

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Structure and dielectric characterization of a chemically vapor deposited diamond thick film

Published:1994-11 Issue:2-3 Volume:27 Page:81-85
ISSN:0921-5107
Container-title:Materials Science and Engineering: B
language:en
Short-container-title:Materials Science and Engineering: B

Author:

Alam M.,Lucero A.

Publisher

Elsevier BV

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference9 articles.

1. Diamond electronic devices-a critical appraisal

2. Applications of Diamond Films and Related Materials;Dismukes,1991

3. Proc. 2nd. Int. Symp. on Diamond Materials;Yoder,1991

4. Thermal Conduction in Solids;Berman,1976

5. Applications of Diamond Films and Related Materials;Eden,1991

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Brazing of diamond to invar with Ag-Cu-Ti filler alloy: Wettability, microstructure and mechanical performance;Diamond and Related Materials;2024-05

2. Utilization of Dielectric Properties Assessment To Evaluate the Catalytic Activity and Rate of Deactivation of Heterogeneous Catalysts;Industrial & Engineering Chemistry Research;2017-02-14

3. Dielectric Properties and Applications of Nanocrystalline Diamond Thin Films;Processing and Properties of Advanced Ceramics and Composites VII;2015-10-30

4. Dielectric properties of hydrogen-incorporated chemical vapor deposited diamond thin films;Journal of Applied Physics;2007-10

5. Dielectric measurements on oxidized and hydrogenated chemical vapor deposited diamond films;Journal of Applied Physics;2002

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