Influence of temperature on the properties of films prepared by plasma-enhanced chemical vapour deposition
Author:
Publisher
Elsevier BV
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Reference17 articles.
1. SiCxNy:H films produced from an r.f. discharge of the SiH4CH4NH3 system
2. Chemical vapor deposition in the systems silicon-carbon and silicon-carbon-nitrogen
3. Preparation of amorphous Si3N4-C plate by chemical vapour deposition
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