Plasma-enhanced chemical vapour deposition of SiC layers using a liquid source
Author:
Publisher
Elsevier BV
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Reference6 articles.
1. SSA Conf.;Anon,1989
Cited by 4 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Characterization of Tensile Strained Si1-yCyAlloy Grown by Photo- and Plasma Chemical Vapor Deposition at Very Low Temperature;Japanese Journal of Applied Physics;2001-07-15
2. Plasma-Enhanced Chemical Vapor Deposition (PECVD);Carbide, Nitride and Boride Materials Synthesis and Processing;1997
3. Amorphous silicon carbide and its application in silicon micromachining;Sensors and Actuators A: Physical;1994-04
4. New flexible reactor design for R&D PECVD deposition systems;Surface and Coatings Technology;1993-10
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