The role of atmospheric oxygen and water in the generation of water marks on the silicon surface in cleaning processes-Reference-Cited by-同舟云学术

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The role of atmospheric oxygen and water in the generation of water marks on the silicon surface in cleaning processes

Published:1989-10 Issue:1-4 Volume:4 Page:401-405
ISSN:0921-5107
Container-title:Materials Science and Engineering: B
language:en
Short-container-title:Materials Science and Engineering: B

Author:

Watanabe M.,Hamano M.,Harazono M.

Publisher

Elsevier BV

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference10 articles.

1. Proc. 9th Int. Symp. on Contamination Control;Fukumoto,1988

2. Effects of Wet Cleaning on Si Contaminated with Heavy Metals during Reactive Ion Etching

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