EUV photofragmentation and oxidation of a polyarylene – Sulfonium resist: XPS and NEXAFS study-Reference-Cited by-同舟云学术

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EUV photofragmentation and oxidation of a polyarylene – Sulfonium resist: XPS and NEXAFS study

Published:2018-09 Issue: Volume:364 Page:373-381
ISSN:1010-6030
Container-title:Journal of Photochemistry and Photobiology A: Chemistry
language:en
Short-container-title:Journal of Photochemistry and Photobiology A: Chemistry

Author:

Belmonte Guilherme Kretzmann,da Silva Moura Cleverson Alves,Reddy Pulikanti Guruprasad,Gonsalves Kenneth E.,Weibel Daniel Eduardo

Funder

Coordenação de Aperfeiçoamento de Pessoal de Nível Superior

CAPES

LNLS, Brazil

Publisher

Elsevier BV

Subject

General Physics and Astronomy,General Chemical Engineering,General Chemistry

Reference65 articles.

1. Extreme ultraviolet resist materials for sub-7 nm patterning;Li;Chem. Soc. Rev.,2017

2. Vacuum ultraviolet photochemistry of polymers;Skurat;Nucl. Instrum. Methods Phys. Res. Sect. B,2003

3. Resist materials and processes for extreme ultraviolet lithography;Itani;J. J. Appl. Phys.,2013

4. Nanometer interface and materials control for multilayer EUV-optical applications;Louis;Prog. Surf. Sci.,2011

5. Aspects of nanometer scale imaging with extreme ultraviolet (EUV) laboratory sources;Wachulak;Opto-Electron. Rev.,2012

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