Protection of hematite photoelectrodes by ALD-TiO2 capping-Reference-Cited by-同舟云学术

Protection of hematite photoelectrodes by ALD-TiO2 capping

Published:2021-03 Issue: Volume:409 Page:113126
ISSN:1010-6030
Container-title:Journal of Photochemistry and Photobiology A: Chemistry
language:en
Short-container-title:Journal of Photochemistry and Photobiology A: Chemistry

Author:

Imrich T.^ORCID,Zazpe R.,Krýsová H.,Paušová Š.,Dvorak F.,Rodriguez-Pereira J.^ORCID,Michalicka J.,Man O.^ORCID,Macak J.M.,Neumann-Spallart M.,Krýsa J.^ORCID

Funder

Ministerstvo Školství, Mládeže a Tělovýchovy

Grantová Agentura České Republiky

Publisher

Elsevier BV

Subject

General Physics and Astronomy,General Chemical Engineering,General Chemistry

Reference24 articles.

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3. Investigation of (Leaky) ALD TiO2 protection layers for water-splitting photoelectrodes;Moehl;ACS Appl. Mater. Interfaces,2017

4. Preparation of Sn-doped semiconducting Fe2O3 (hematite) layers by aerosol pyrolysis;Kotrla;Catal. Today,2018

5. Hematite films by aerosol pyrolysis: influence of substrate and photocorrosion suppression by TiO2 capping;Krýsa;Catal. Today,2019

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