E and H regimes of plasma enhanced chemical vapor deposition of diamond-like carbon film in low frequency inductively coupled plasma reactor
Author:
Publisher
Elsevier BV
Subject
Electrical and Electronic Engineering,Materials Chemistry,Mechanical Engineering,General Chemistry,Electronic, Optical and Magnetic Materials
Reference34 articles.
1. Structural and tribological characterization of protective amorphous diamond-like carbon and amorphous CNx overcoats for next generation hard disks
2. Properties of plasma enhanced chemical vapor deposition diamond-like carbon films as field electron emitters prepared in different regimes
3. High rate deposition of diamond-like carbon films by sheet-like plasma chemical vapor deposition
4. Diamond‐like carbon films deposited by laser ablation using frozen acetylene targets
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1. Hydrogenated amorphous carbon films deposited using plasma enhanced chemical vapor deposition processes;Korean Journal of Chemical Engineering;2023-05-17
2. Highly tunable electronic properties in plasma-synthesized B-doped microcrystalline-to-amorphous silicon nanostructure for solar cell applications;Journal of Applied Physics;2017-10-07
3. Scalable Production of Silicon Nanocone Solar Cells in Integrated Plasma Photovoltaic Nanofabrication Cluster;Plasma Processes and Polymers;2015-11-09
4. Development of a polygonal barrel-plasma enhanced chemical vapor deposition method for preparing powdered materials with a diamond-like carbon film;Chemical Engineering Journal;2012-10
5. Electrochemical behavior of diamond-like-carbon coatings deposited on AlTiC (Al2O3+TiC) ceramic composite substrate in HCl solution;Electrochimica Acta;2011-01
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