The growth of thick cBN films employing fluorine chemistry and ECR deposition
Author:
Publisher
Elsevier BV
Subject
Electrical and Electronic Engineering,Materials Chemistry,Mechanical Engineering,General Chemistry,Electronic, Optical and Magnetic Materials
Cited by 24 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Nucleation of cubic boron nitride on boron-doped diamond via plasma enhanced chemical vapor deposition;Journal of Applied Physics;2023-06-01
2. Impact on the microstructure, optical and electrical properties of cubic boron nitride thin films under post thermal annealing;Journal of Alloys and Compounds;2022-11
3. Catalytic CVD synthesis of boron nitride and carbon nanomaterials – synergies between experiment and theory;Physical Chemistry Chemical Physics;2017
4. In situ photoelectron spectroscopic characterization of c-BN films deposited via plasma enhanced chemical vapor deposition employing fluorine chemistry;Diamond and Related Materials;2015-06
5. Doping and electrical properties of cubic boron nitride thin films: A critical review;Thin Solid Films;2013-10
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