On the low-temperature threshold for cubic boron nitride formation in energetic film deposition

Author:

McCarty K.F.,Mirkarimi P.B.,Medlin D.L.,Friedmann T.A.,Barbour J.C.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Materials Chemistry,Mechanical Engineering,General Chemistry,Electronic, Optical and Magnetic Materials

Reference37 articles.

1. Preparation of cubic boron nitride film by activated reactive evaporation with a gas activation nozzle

2. Bombardment Stabilization of Cubic Boron Nitride, Science and Technology of Thin Films;Hackenberger,1995

3. Critical Review of Advances in Cubic Boron Nitride Film Synthesis, Science and Technology of Ceramic Hard Coatings;Mirkarimi,1996

4. Phase control of cubic boron nitride thin films

5. Recent results in cubic boron nitride deposition in light of the sputter model

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