Diamond nucleation enhancement by hydrofluoric acid etching of silicon substrate-Reference-Cited by-同舟云学术

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Diamond nucleation enhancement by hydrofluoric acid etching of silicon substrate

Published:1997-03 Issue:2-4 Volume:6 Page:440-443
ISSN:0925-9635
Container-title:Diamond and Related Materials
language:en
Short-container-title:Diamond and Related Materials

Author:

Schelz S.,Borges C.F.M.,Martinu L.,Moisan M.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Materials Chemistry,Mechanical Engineering,General Chemistry,Electronic, Optical and Magnetic Materials

Reference11 articles.

1. Influence of process parameters on diamond film CVD in a surface-wave driven microwave plasma reactor

2. Reaction of water with hydrofluoric acid treated silicon(111) and (100) surfaces

3. The formation of hydrogen passivated silicon single‐crystal surfaces using ultraviolet cleaning and HF etching

4. Adhesion of CVD diamond films on silicon substrates of different crystallographic orientations

5. Measurement of adsorbed F atoms on a HF treated Si surface using infrared reflection absorption spectroscopy

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Growth and field emission characteristics of diamond films on macroporous silicon substrate;Journal of Applied Physics;2008-11-15

2. Synthesis of unstrained failure-resistant nanocrystalline diamond films;Thin Solid Films;2007-07

3. Effect of substrate pregrowth treatments on characteristics of low-temperature diamondlike carbon films prepared by very-high-frequency chemical vapor deposition;Journal of Materials Research;2002-02

4. A new surface pretreatment approach for enhancing diamond nucleation;Journal of Materials Research;1999-12

5. Characterization of diamond films deposited with a 915-MHz scaled-up surface-wave-sustained plasma;Diamond and Related Materials;1998-12

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