Chemical vapor deposition precursor chemistry. 5. The photolytic laser deposition of aluminum thin films by chemical vapor deposition-Reference-Cited by-同舟云学术

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Chemical vapor deposition precursor chemistry. 5. The photolytic laser deposition of aluminum thin films by chemical vapor deposition

Published:1996-05 Issue:5 Volume:57 Page:563-570
ISSN:0022-3697
Container-title:Journal of Physics and Chemistry of Solids
language:en
Short-container-title:Journal of Physics and Chemistry of Solids

Author:

Glass John A.,Hwang Seong-Don,Datta Saswatti,Robertson Brian,Spencer James T.

Publisher

Elsevier BV

Subject

Condensed Matter Physics,General Materials Science,General Chemistry

Reference69 articles.

1. Chemical Aspects of Chemical Vapor Deposition for Metallization;Simmonds,1994

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3. Chemical vapor deposition of metal borides: 6. The formation of neodymium boride thin film materials from polyhedral boron clusters and metal halides by chemical vapor deposition;Applied Organometallic Chemistry;2008

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