Strain relaxation process and evolution of crystalline morphologies during the growths of SiGe on Si(110) by solid-source molecular beam epitaxy

Author:

Saito Shingo,Sano Yuichi,Yamada Takane,Hara Kosuke O.,Yamanaka Junji,Nakagawa Kiyokazu,Arimoto Keisuke

Funder

"Grants-in-Aid for Scientific Research" provided by

Japan Society for the Promotion of Science

Publisher

Elsevier BV

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference30 articles.

1. (110)-Surface strained-SOI CMOS devices with higher carrier mobility;Mizuno;Symp. VLSI Technol.,2003

2. 110)-Surface strained-SOI CMOS devices;Mizuno;IEEE Trans. Electron. Dev.,2005

3. Very high carrier mobility for high-performance CMOS on a Si(110) surface;Teramoto;IEEE Trans. Electron. Dev.,2007

4. High performance CMOS fabricated on hybrid substrate with different crystal orientations;Yang;IEDM,2003

5. 1.5-nm gate oxide CMOS on (110) surface-oriented Si substrate;Sasaki Momose;IEEE Trans. Electron. Dev.,2003

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